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Park Systems is the Atomic Force Microscope technology leader, providing prosucts that address the requirements of research and industrial nanoscale applications,With a unique scanner design that allows for True Non - Contact Imaging in liquid and air environments,all systems are fully compatible with a lengthy list of innovative and powerful options.All systems are designed with ease-of-use, accuracy, and durability in mind, and provide our customers with the ultimate resources for meeting all present and future needs, Boasting the longest history in the AFM industry, Park System scomprehensive portfolio of products, software, sevices, and expertise is matched only by our commitment to our customers.
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Non Contact In-liquid Imaging and Ion Conductance Microscopy
The XE-Bio is an enabling solution for biomedical and life science, uniquely integrating non-contact Atomic Force Microscopy (AFM) and Ion Conductance Microscopy(ICM). The modular design of the XE-Bio allows easy exchange between non-contact AFM and ICM. Designed for non-invasive in-liquid imaging, the combined imaging capability of AFM, ICM, and inverted optical microscopy makes the XE-Bio ideal for imaging biological samples in dynamic conditions such as living cells. Moreover, ICM can be adapted to enable a host of powerful applications in nanoscale electrophysiology
Brochure
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For NSOM and Raman-AFM Measurements
The XE-NSOM is specially designed and tailored for advanced optical measurements including Near-field Scanning Optical Microscopy (NSOM) and Raman Spectrometry. The XE-NSOM offers a complete AFM system setup with unprecedented adaptability for these optical experiments. The high-performance Z-servo scanner of the XE-NSOM supports True Non-Contact AFM and utilizes cantilever-based closed-loop feedback technology.
- Seamless integration of AFM and optical measurements
- Upgradeable modular design supports AFM, NSOM and Raman Spectroscopy
- Versatility supporting various reflection/transmission modes
- Optical head design provides convenient experimental access to the sample
- Easy alignment of optical axes to the photon detection system
Brochure
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Affordable, Research-Grade AFM with Flexible Sample Handling
An economic extension of the XE-100, the XE-70 is Park Systems’ new AFM solution for budget conscious customers. Having a compact mechanical design, the XE-70 continues the innovative technology of the XE-series that sets it apart from conventional AFM. The XE-70 shares the same modes, options, and electronics as well as all other systems in the XE product line.
- Compact mechanical design
- 50 μm × 50 μm XY scan range
- 12 μm Z scan range
- Manual optics stage
- Complete new system with XE electronics
Brochure
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For Combined Capability of AFM and Inverted Optical Microscope
The XE-120 seamlessly combines AFM capabilities with the versatility of an inverted optical microscope. The AFM enables optical sample surface identification in combination with AFM imaging in ambient or liquid environment.
- Supports all XE modes and options
- 100 μm × 100 μm XY scan range
- Up to 25 μm Z scan range
- Motorized optics stage
- Ultimate in user convenience for various optical measurements
- Fully compatible with fluorescence imaging mode and confocal microscopes
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Premier Cross-Functional AFM with Motorized Sample Stage
With the arrival of the XE-150, Park Systems's large sample AFM, Non-Contact AFM imaging has become the most feasible and practical way to scan your large samples with the ultimate AFM resolution and reliability. The XY motorized sample stage is optimized for large sample (150 mm × 150 mm) placement and allows full travel over the entire sample.
- Supports up to 6 inch wafer
- 100 µm × 100 µm XY scan range
- Up to 25 µm Z scan range
- Enhanced acoustic enclosure
- Fully motorized XY stage travels entire 150mm × 150 mm
Brochure
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Enlarged Capacity Cross-Functional AFM with Motorized Sample Stage
The XE-200 is an AFM with increased capacity that supports 200 mm wafer investigation. In addition to the precise scan performance provided by True Non-Contact mode, the XE-200 offers users an encoded XY stage that travels over the entire 200 mm x 200 mm sample area, an enlarged XY scan range of 200 μm x 200 μm, and a Z scan range of 25 μm. Also, the industrial-grade automation features of the instrument greatly minimize the user‘s required participation during system operation.
- Supports up to 8 inch wafer
- 200 μm × 200 μm XY scan range
- 25 μm Z scan range
- Industrial-grade acoustic enclosure with steel frame
- Fully motorized XY stage travels entire 200 mm × 200 mm
Brochure
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Automatic Defect Review AFM for Hard Disk Media and Substrates
The XE-HDM is an automated industrial XE-series AFM, especially designed for hard disk media and substrate applications. With its newly developed user convenience and safety features, the XE-HDM combines the superb performance of an XE-series with the high throughput measurement efficiency required by the hard disk media manufacturers.
- Supports All Sizes of Hard Disk Media and Substrates
- Fast Scanning of Hard Disk Media and Substrate Surfaces
- Variable Zoom Range for Easy Defect Search
- Fast-Tip Approach to a Sample Surface
- Head Crash Prevention System to Meet Industrial Safety Needs
Brochure
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For In-Line Pole Tip Recession Metrology of Hard Disk Sliders
HDD Slider manufacturers can now reliably depend on Park Systems’ XE-PTR, a fully automated industrial in-line AFM for automatic Pole Tip Recession measurements on rowbar-level sliders. As most HDD manufacturers are turning to PMR (Perpendicular Magnetic Recording), sub-nano scale accuracy, repeatability and throughput are the keys to slider inspection for improving the overall yield. Matching the highest resolution AFM in the world with the lowest one gauge sigma value imaginable for repeatability and reproduction, the XE-PTR is the perfect solution for slider manufacturers who, until now, had very limited choice of industrial grade in-line inspection tools for HDD slider metrology. We, Park Systems, take pride in providing you with the metrology solution you have been longing for.
- Allowable Sample Size: Rowbars and Sliders
- Automatic Data Acquisition and Analysis of Sliders
- Designed Specifically for Manufacturing Facilities
- Automatic Tip Exchange (Optional)
Brochure
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For Wafer-based Inspection and Metrology
The XE-WAFER is a fully automated industrial AFM designed specifically to address surface roughness, trench width, depth and angle measurements on 200mm & 300mm wafers in a production environment. The system provides superior accuracy and precision nanometrology than any in the market today. Providing the highest resolution and the lowest gage sigma value imaginable for repeatability and reproducibility in the world, the XE-WAFER is the perfect solution for the semiconductor and hard disk drive industry which, until now, had very limited choice of industrial grade in-line inspection tools. We, Park Systems, take pride in providing you with the metrology solution you have been longing for.
- Allowable Sample Size (Up to 300mm Wafers)
- Allowable Scan Size (100 μm x 100 μm, Optional: 200 μm x 200 μm)
- Automatic Data Acquisition & Analysis of High Aspect Ratio Trench Features on Wafers
- Acoustic Enclosure with Built-in Anti Vibration Isolation System
- Designed Specifically for Production Facilities
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For Undercut Characterization and Sidewall Metrology
Park Systems has revolutionized the AFM with the introduction of the XE-3DM, the fully automated AFM system designed for overhang and trench profiles, sidewall roughness and imaging, and critical angle measurements. The unique design of the XE-3DM, made possible by the XE-series’ decoupled XY and Z scanning system, allows for characterization of undercut features as well as top surfaces. In using Park Systems’ True Non-Contact mode, the XE-3DM can realize non-destructive imaging of soft photoresist structures at the same scanning speed as any other XE-series platform.
- Allowable Sample Size (200/300mm Wafers)
- Automatic Data Acquisition and Analysis of Trench and Overhang Features
- Acoustic Enclosure with Built in Anti-Vibration Isolation System
- Equipment Front End Module (EFEM) for Wafer Handling (optional)
- Designed Specifically for Manufacturing Facilities
Brochure
XE-3DM Video
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For Flat Panel Display Inspection and Metrology
Atomic Force Microscopy (AFM) is emerging as an essential tool in many industries. With its ability to accurately measure critical dimensions in the micrometer to nanometer regime, the AFM is becoming a powerhouse in applications involving surface roughness, trench width, depth, sidewall slope, and line width characterization. The completely automated XE-LCD is designed for characterization of flat panel displays as either an in-line or off-line inspection tool.
- Automatic Non-Contact AFM Measurement
- Automatic Navigation and Focusing
- Automatic Glass Handling
- Automatic Data Analysis
- Glass Size Up to 1600 x 1200 mm
- Automatic Tip Exchange (Optional)
The XE-LCD is a completely automated AFM/SPM system for in-line characterization of flat panel displays.
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Galleries
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